Principles of chemical vapor deposition (Record no. 32855)
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| 000 -LEADER | |
|---|---|
| fixed length control field | 00499nam a2200193Ia 4500 |
| 005 - DATE AND TIME OF LATEST TRANSACTION | |
| control field | 20200708102129.0 |
| 008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION | |
| fixed length control field | 200708b ||||| |||| 00| 0 eng d |
| 020 ## - INTERNATIONAL STANDARD BOOK NUMBER | |
| International Standard Book Number | 1402012489 |
| 041 ## - LANGUAGE | |
| Language of text/sound track | English |
| 082 ## - DEWEY DECIMAL CLASSIFICATION NUMBER | |
| Classification number | 620.11 |
| Author Mark | PRI |
| DDC Edition number | 23 |
| 245 ## - TITLE STATEMENT | |
| Title | Principles of chemical vapor deposition |
| 260 ## - PUBLICATION, DISTRIBUTION, ETC. | |
| Place of publication, distribution, etc. | Boston |
| Name of publisher, distributor, etc. | Kluwer Academic |
| Date of publication, distribution, etc. | 2003 |
| 300 ## - PHYSICAL DESCRIPTION | |
| Extent | xi, 273 p. |
| 500 ## - GENERAL NOTE | |
| General note | Includes index. |
| 700 ## - ADDED ENTRY--PERSONAL NAME | |
| 9 (RLIN) | 32942 |
| Personal name | Dobkin, D.M. |
| Role | Editor |
| 700 ## - ADDED ENTRY--PERSONAL NAME | |
| 9 (RLIN) | 92870 |
| Personal name | Zuraw, M.K. |
| Role | Editor |
| 942 ## - ADDED ENTRY ELEMENTS (KOHA) | |
| item type | Books in Stacks (S) |
| Withdrawn status | Lost status | Damaged status | Not for loan | Permanent Location | Current Location | Shelving location | Date acquired | Source of acquisition | Price | Full call number | Accession Number | Date last seen | item type |
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
| Engineering Library | Engineering Library | Science & Technology | 2018-07-13 | Not Known | 0.00 | 620.11 PRI | 250989 | 2018-07-13 | Books in Stacks (S) |