000 -LEADER |
fixed length control field |
00600nam a2200205Ia 4500 |
005 - DATE AND TIME OF LATEST TRANSACTION |
control field |
20200707114048.0 |
008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION |
fixed length control field |
180712s9999 xx 000 0 und d |
020 ## - INTERNATIONAL STANDARD BOOK NUMBER |
International Standard Book Number |
9780854044658 |
041 ## - LANGUAGE |
Language of text/sound track |
English |
082 ## - DEWEY DECIMAL CLASSIFICATION NUMBER |
Classification number |
620.11 |
Author Mark |
CHE |
DDC Edition number |
23 |
100 ## - MAIN ENTRY--PERSONAL NAME |
Personal name |
Jones, Anthony C., ed. |
100 ## - MAIN ENTRY--PERSONAL NAME |
Personal name |
Hitchman, Michael L., ed. |
245 ## - TITLE STATEMENT |
Title |
Chemical vapour deposition: precursors, processes and applications |
260 ## - PUBLICATION, DISTRIBUTION, ETC. |
Place of publication, distribution, etc. |
Cambridge |
Name of publisher, distributor, etc. |
Royal Society of Chemistry |
Date of publication, distribution, etc. |
2009 |
300 ## - PHYSICAL DESCRIPTION |
Extent |
xv, 582 p. |
500 ## - GENERAL NOTE |
General note |
Includes index. |
700 ## - ADDED ENTRY--PERSONAL NAME |
9 (RLIN) |
101763 |
Personal name |
Anthony C Jones, Michael L Hitchman |
942 ## - ADDED ENTRY ELEMENTS (KOHA) |
item type |
Books in Stacks (S) |