000 00499nam a2200193Ia 4500
999 _c32855
_d32855
005 20200708102129.0
008 200708b ||||| |||| 00| 0 eng d
020 _a1402012489
041 _aEN
082 _a620.11
_bPRI
_223
245 _aPrinciples of chemical vapor deposition
260 _aBoston
_bKluwer Academic
_c2003
300 _axi, 273 p.
500 _a Includes index.
509 _aNS
700 _932942
_aDobkin, D.M.
_eedt
700 _992870
_a Zuraw, M.K.
_eedt
942 _cS