Principles of chemical vapor deposition
Contributor(s): Dobkin, D.M [Editor] | Zuraw, M.K [Editor].
Publisher: Boston Kluwer Academic 2003Description: xi, 273 p.ISBN: 1402012489.DDC classification: 620.11Item type | Current location | Collection | Call number | Status | Date due | Barcode |
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Books in Stacks (S) | Engineering Library Science & Technology | S | 620.11 PRI (Browse shelf) | Available | 250989 |
Browsing Engineering Library Shelves , Shelving location: Science & Technology , Collection code: S Close shelf browser
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620.11 KOM Building materials and components | 620.11 MAT Materials and mechanical engineering : recent trends | 620.11 POP Mechanics of materials | 620.11 PRI Principles of chemical vapor deposition | 620.11 PRO Progress in materials science and engineering | 620.11 RAG Materials science and engineering : a first course | 620.11 SAD Strength of materials |
Includes index.
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